Materials Science Group

Indira Gandhi Centre for Atomic Research, Kalpakkam

X-RAY AND CRYSTAL GROWTH SECTION

· High Temperature Powder X-Ray Diffractometer   (300-2000 K)

· Characterization facility for single crystals

· Dielectric spectroscopy system ; P-E Loop measurement system;

· Crystal growth facilities : Travelling heating technique ; OFZ furnace; Bridgman two-zone vertical furnace.

SQUIDS  &  APPLICATIONS SECTION

· DC/RF Magnetron Sputtering System

· Pulsed LASER Deposition System  (Excimer LASER, KrF, 248 nm, 900˚C)

· RF Ion Beam Etching System

· Liquid Helium and Liquid Nitrogen Plant   (LHe: 15000lts/year;  LN2: 1,20,000 lts/year)

HIGH PRESSURE PHYSICS SECTION

 

· Laser Heated Diamond Anvil Cell Facility  (50 GPa, 3000K)

· Micro focus XRD based  High Pressure High Temperature facility ( 25 GPa, 1200K)

· High Pressure Angle Dispersive X-ray Diffraction Facility

· High Pressure-High Temperature treatment (8 GPa, 1000K)

LOW TEMPERATURE STUDIES SECTION

· 10 mK Triton 200-10 Dilution refrigerator 

· Magnetisation  & susceptibility measurements as function of  temperature ( 2 K to 300 K)  and magnetic  field (0 -16 Tesla)

· Resistivity under pressure upto 7.5 GPa from 4  to 300 K

· Magento- resistivity & Hall effect measurements upto to 0.3 K and field 8 Tesla (Heliox system)

· Thermopower measurements (4-300K)

· Pulsed Laser Deposition system & Home built DC Magnetron Deposition system for thin film deposition

LIGHT SCATTERING STUDIES SECTION

 

·  Micro Raman Spectrometer (30-4500 cm-1; T emp:  10 K to 873 K; P up to 40 GPa)

· Static & dynamic light scattering (Temp. range 10 °C to 60 °C; q range 0.5 ´105/cm to 2.5 ´105/cm)

· Confocal laser scanning microscope

· Rheometer (Temp : 0 to 200 °C)

· Brillouin spectrometer(10 to 600 GHz; Temp :  80 K to 1273 K)

THEORETICAL STUDIES SECTION

· 405 nm pump based Entanglement generators through SPDC

· 9W OPCPA (1030nm) with harmonic generators

·  Gap-free Tunable OPA 325 nm-2000nm

·  Pump-probe spectrometer

METAL PHYSICS SECTION

· Positron lifetime spectrometer

· Coincident Doppler broadening spectrometer

· Variable low energy positron beam based Doppler broadening spectrometer for depth resolved studies

· Pulsed positron lifetime spectrometer for depth resolved lifetime studies (development in progress)

· Time differential perturbed angular correlation spectrometer; Mossbauer spectrometer;  FTIR spectrometer ; Auger electron spectrometer

COMPUTATIONAL MATERIALS SCIENCE  SECTION

· Ab-initio packages VASP, SIESTA, WIEN-2K, ABINIT

·  Molecular dynamics packages  LAMMPS, CPMD, GULP

·  Cluster expansion code ATAT

ION BEAM PHYSICS SECTION

· 150 kV and 1.7 MV ion accelerators for implantation and sputtering experiments.

· Ion-beam analysis (RBS, Resonant RBS, ERDA, PIXE, NRA, ion channeling)

· Electron microscopy (SEM & HRTEM) ; Scanning Tunneling Microscopy

· Low temperature (liquid He) Photoluminescence spectroscopy.

· Deep level transient spectroscopy.

ACCELERATOR & RADIATION DAMAGE SECTION

· 1.7 MV tandetron accelerator comprising of Implantation,  Analysis and Ultra high vacuum beam lines

· v150 kV gaseous ion implanter- typical currents of several micro amperes.

· v400 kV gaseous ion implanter

· Dual beam irradiation facility :

· vSimultaneous heavy ion irradiation from 1.7 MV tandetron accelerator & helium injection from 400 kV accelerator.

· Ion irradiation under UHV conditions (10‑9 mBar range)

THIN FILMS & COATINGS SECTION

· Secondary ion mass spectrometer; HT-HV Spectrotribometer

· Nano-indenter;  Scratch tester;  Micro & Nano Tribometers

· Grazing incident X-ray diffractometer

· Surface profilometer

· RF/DC magnetron sputtering;  Pulsed  laser ablation; Ion beam sputtering & UHV electron beam evaporator

· Pyrolysis ; Electro-deposition & Electro-spinning; Gas-dynamic Spray

NANOMATERIALS & CHARACTERIZATION SECTION

· ECR-PECVD, HFCVD & ThCVD for growing diamond, graphene, DLC and CNTs

· PIII-D for thin film deposition and shallow ion implantation

· Focused ion beam for nanostructuring and patterning

· Soft-chemistry based nanomaterials synthesis

· Multi-sensor test facility

· Morphological studies by OM and SPM

NANOMATERIALS & SENSORS SECTION

· Scanning Probe Microscopy coupled with Micro Raman Spectrometer

· Four Probe (AFM/KPFM/CFM/Nanolithography/NSOM)

·  Exposure Facility for Gas Sensing (EFGS)

· Chemical vapour deposition (CVD) Chamber for Vapour-Liquid-Solid Growth 

· Double Barrier LB trough

· Fiber optic based UV-Visible absorption/transmission spectroscopy

ELECTRONICS & INSTRUMENTATION SECTION

· Resistivity,  IV & CV  characterization system from 77K to 873K  

· Embedded systems based Instrumentation

· Micro-fabrication facilities including Direct Laser writer, 3D optical profiler and wet bench, Nano vibration Analyser, Atomic Force Microscope  

· Spectroscopic Ellipsometer and contact angle measurement system

Facilities

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